What is Focused Ion Beam Milling? Focused ion beam (FIB) milling is a nanofabrication technique that uses a focused beam of ions to precisely mill, etch, or deposit materials at the nanoscale. It ...

Etching: After the surface modification step, the modified layer is selectively removed using an etchant. The etchant can be a different reactive species, such as a gas, plasma, or ion beam. The ...

Reactive Ion Etch (RIE) is a physical etch process. A rich plasma has been made just above the wafer, and the ions are expedited toward the surface to generate a highly powerful anisotropic etch.

At least that’s [Sam]’s plan, which his new reactive-ion etching setup aims to make possible. While his Z1 dual differential amplifier chip was a huge success, the photolithography process he ...

secondary ion mass spectrometer that is designed for analyzing secondary ions from the ion beam etch process. This system is equipped with integrated software consisting of process specific algorithms ...

Kaufman and Robinson, Inc. (KRI®) engineers and manufactures broad beam ion and plasma products ... processes include the precision deposition of thin films, remote plasma etching of patterned wafers, ...