What is Focused Ion Beam Milling? Focused ion beam (FIB) milling is a nanofabrication technique that uses a focused beam of ions to precisely mill, etch, or deposit materials at the nanoscale. It ...

The latest abilities are offered for electron and ion beam-induced deposition and etching on DualBeam systems with optional Thermo Scientific MultiChem or GIS Gas Delivery Systems. Customized to ...

secondary ion mass spectrometer that is designed for analyzing secondary ions from the ion beam etch process. This system is equipped with integrated software consisting of process specific algorithms ...

The technique is highly efficient because it is several orders faster than electron beam writing and ion beam etching, and is applicable to different materials. This technique has potential ...

What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...

Reactive Ion Etch (RIE) is a physical etch process. A rich plasma has been made just above the wafer, and the ions are expedited toward the surface to generate a highly powerful anisotropic etch.

Its technologies consist of metal organic chemical vapor deposition, advanced packaging lithography, wet etch and clean, laser annealing, ion beam, molecular beam epitaxy, wafer inspection ...