The Trion ICP/RIE Etch PHTII-4301 (TRION) is a reactive ion etcher with the addition of a inductively coupled plasma to achieve a high density plasma for enhanced anisotropic etching. This system is ...

The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based ...

Plasma reactive-ion etching systems incorporate several steps to the integrated circuit fabrication process. Reactive plasm, deposited onto the wafer, removes and refines excess material to “etch” or ...

The isotropic etching/cleaning mode isn't directional. Plasma Etch, 3522 Arrowhead Dr., Carson City, NV 89706, (775)883-1336, www.plasmaetch.com ...